Materials Design by Computer Simulation IV The Science Reports of the Research Institutes, Tohoku University (Sendai, Japan), RITU, Series A (Physics, Chemistry and Metallurgy), Vol. 43, No. 1.

Herausgeber: Prof. Yoshiyuki Kawazoe

Titel: Materials Design by Computer Simulation IV
The Science Reports of the Research Institutes, Tohoku University (Sendai, Japan), RITU, Series A (Physics, Chemistry and Metallurgy), Vol. 43, No. 1

Auflage: Erstausgabe

Jahr: 1997

Seitenanzahl: 82 Seiten mit zahlreichen Bildern

Einband: Taschenbuch, Paperback

Bemerkung: Concept of the Critical Nucleus in Nucleation     K. NISHIOKA and I. L. MAKSIMOV - Numerical Simulation of the Kinetic Critical Nucleus    M. SANADA, K. NISHIOKA, M. OKADA and I. L. MAKSIMOV - Two Dimensional Nucleation Process by Monte Carlo Simulation   T. IRISAWA, K. MATSUMOTO, Y. ARIMA and T. KAN - Non-isothermal Nucleation in Strongly Supercooled Liquids    K OHNO, H. TRINKAUS and H. MÜLLER-KRUMBHAAR - Renormalization of Interatomic Potentials and Lattice Gas Models     K. OHNO - A Monte Carlo Simulation Describing Melting Transition of Si-Type Structure in the Condensed Phase with BCC Lattice Model Including Many-Body Interactions    R. SAHARA, H. MIZUSEKI, K. OHNO, S. UDA, T. FUKUDA and Y. KAWAZOE - Intermolecular Potentials and Phase Diagrams     M. HASEGAWA and K. OHNO - Influence of Cluster Size on Nucleation Rate    S. UDAI - Molecular Dynamics Simulation for the (Magic Number) Size Effect in Nucleation and Evaporation of Clusters   T. IKESHOJI - Bubble Formation in Silicon-Quartz Interface     K. KAKIMOTO, M. EGUCHI and H. OZOE - Nucleation Processes in Incommensurate Phases    K. PARLINSKI - A New Model for Crystal Growth under High Magnetic Field  ‒  Effect of Environment in Diffusion-Limited Aggregation ‒    H. MIZUSEKI, K. TANAKA, K. OHNO and Y. KAWAZOE - A Mechanism of 13% Lattice Expansion in C60 FCC (110) Thin Films Grown on the GaAs (001) As-rich Surface   K. OHNO, Z.-Q. LI, H. KAMIYAMA, Y. KAWAZOE, Q. XUE, T. HASHIZUME, Y. HASEGAWA, H. SHINOHARA and T. SAKURAI - Etchant and Probabilistic Ballistic Models of Diamond Thin Film Growth   K. OHNO, M. ITOH, R. SAHARA, M. TAKAHASHI, X. Hu and Y. KAWAZOE - A CCA Model for Gelation Process in Silica Systems    K. OHNO, X. Hu and Y. KAWAZOE

Produktart: Buch

Sprache: Englisch

Länge x Breite: 29.5 cm x 21 cm